Huijuan Xia 1,2†Yanqing Wu 1,3,4,*†Lei Zhang 1,2†Yuanhe Sun 1,2†[ ... ]Renzhong Tai 1,3,5,*†
Author Affiliations
Abstract
1 Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China
2 University of Chinese Academy of Sciences, Beijing 100049, China
3 Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai 201204, China
4 e-mail: wuyanqing@zjlab.org.cn
5 e-mail: tairenzhong@zjlab.org.cn
High-resolution lens-coupled indirect X-ray scintillator imagers are required by many imaging applications. However, the severe weakening of image details prevents its further performance improvement. Through our research, this image degradation is attributed to the broadband loss of the high-spatial-frequency information caused by the high refractive index. A technique known as high-spatial-frequency spectrum enhanced reconstruction is thus proposed to retrieve this information. A two-dimensional high-density array is covered on the scintillator’s exit surface and operates as an encoder based on which high-frequency information can be shifted to the low-frequency region to improve the signal-to-noise ratio. The experimental results show that the middle-high-frequency signal intensities can be increased by an order of magnitude or more, up to 50 times. Therefore, the image details can be effectively enhanced to break through the performance bottleneck of such widely used X-ray imagers for synchrotron radiation facilities or tabletop X-ray tubes.
Photonics Research
2020, 8(7): 07001079
Huijuan Xia 1,2Shumin Yang 1,3,*Liansheng Wang 1,3Jun Zhao 1,3[ ... ]Renzhong Tai 1,3,***
Author Affiliations
Abstract
1 Shanghai Institute of Applied Physics, Shanghai 201800, China
2 University of Chinese Academy of Sciences, Beijing 100049, China
3 Shanghai Synchrotron Radiation Facility, Shanghai Advanced Research Institute, Shanghai 201204, China
Achromatic Talbot lithography (ATL) with high resolution has been demonstrated to be an excellent technique for large area periodic nano-fabrication. In this work, the uniformity of pattern distribution in ATL was studied in detail. Two ATL transmission masks with ~50% duty cycle in a square lattice were illuminated by a spatial coherent broadband extreme ultraviolet beam with a relative bandwidth of 2.38%. Nonuniform dot size distribution was observed by experiments and finite-difference time-domain simulations. The sum of the two kinds of diffraction patterns, with different lattice directions (45° rotated) and different intensity distributions, results in the final nonuniform pattern distribution.
220.3740 Lithography 220.4241 Nanostructure fabrication 
Chinese Optics Letters
2019, 17(6): 062201

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!